Absolute Filtration for Sub-Micron Precision

In the semiconductor industry, a single 0.1μm particle or trace of acid gas can destroy millions in wafer yields. DTAF engineers ultra-low resistance PTFE filters, FFU modules, and AMC chemical systems to protect your most critical ISO Class 1-5 環境.

家

エレクトロニクス & 半導体

The Threats to Your Yield Rate

Modern microelectronics manufacturing faces three critical airborne enemies. We neutralize them all.

Sub-Micron Particulates

As node sizes shrink below 3nm, even 0.1μm particles cause fatal defects on silicon wafers. Standard HEPA is no longer sufficient; ULPA integration is mandatory.

Airborne Molecular Contamination

Acidic/alkaline gases and VOCs from fab processes cause severe lens hazing and wafer corrosion. Physical dust filters cannot stop these chemical threats.

Massive Energy Consumption

Cleanrooms require thousands of Fan Filter Units running 24/7. High-resistance filters force motors into overdrive, skyrocketing electricity overheads.

Engineered for Wafer Fabs & データセンター

From preventing boron off-gassing to neutralizing acidic fumes, DTAF supplies the critical filtration matrix required for ISO Class 1-5 環境.

HEPA & ULPAフィルター

Utilizing boron-free PTFE and ultra-fine glass media. Achieves up to 99.99995% efficiency to eliminate sub-micron particles with zero chemical off-gassing.

クリーンルーム & ラボシステム

Smart Fan Filter Units (FFU) and Laminar Hoods integrated with high-efficiency EC motors. Designed for silent, low-energy operation in massive ceiling arrays.

高温フィルター

Sealed with specialized ceramic or silicone-free components. Engineered to provide H13/H14 particulate filtration for wafer baking and clean drying ovens.

カーボンフィルター

Advanced chemically impregnated filters designed to actively neutralize acidic, アルカリ性, and VOC gases, protecting delicate silicon wafers from corrosion.

Vバンクコンパクトフィルター

Compact rigid design offering massive airflow capacity (up to 4000 m3/h). Essential for energy-efficient pre-filtration in data center cooling systems.

専門家に相談する

Need AMC control strategies or ISO Class 1-3 cleanroom upgrades? Talk to our electronics filtration engineers.

ISO Cleanroom Compliance Mapping

Matching our precise filtration technologies to the strict requirements of ISO 14644-1 標準.

施設 / 応用	ISOクラス (Fed. Std. 209E)	ターゲットの脅威	DTAF の推奨事項
Wafer Fab Core (Lithography)	ISOクラス 1-3 (クラス 1)	Nanoparticles (<0.1μm), AMC, Boron	PTFE ULPA (U16/U17) + Impregnated Chem-Filters
Chip Assembly & Testing	ISOクラス 4-5 (クラス 10/100)	マイクロダスト (0.3μm), Static Discharge	Low-Resistance HEPA (H14) + Smart FFU Modules
Data Center Server Farm	ISOクラス 8 (クラス 100,000)	Dust Buildup, Heat Dissipation, 腐食性ガス	High-Capacity V-Bank (F9/H13) + Carbon Pre-filters

AMCの解決 & 一流のウェーハ工場の高いエネルギーコスト

A major semiconductor manufacturer in Southeast Asia faced unacceptable yield drops due to chemical gas corrosion (AMC), alongside skyrocketing electricity bills from 5,000+ outdated FFU setups.

AMC Defect Rate

Achieved via custom acid/alkali neutralizing Chem-Filters.

22%

エネルギー削減

Enabled by swapping to DTAF’s low-resistance PTFE media.

We Build Cleanroom Filters in a Cleanroom

You cannot manufacture medical or semiconductor grade ULPA filters in a dusty warehouse. あのDTAF, the entire production and assembly process occurs within our strictly monitored 100,000-class cleanroom facility.